Adlyte AG develops, designs, builds and services high‑brightness extreme ultraviolet (EUV) light sources based on laser‑produced plasma (LPP) for semiconductor lithography, mask inspection and EUV microscopy. Its product range includes LPS and HPS systems with specified brightness levels and features such as tin droplet targets, debris mitigation and inline monitoring to support integration and maintainability.
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Industry:Mechanical Engineering Industry
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EUV light sources
Turnkey EUV light sources for the semiconductor industry, for EUV lithography, mask inspection, Aerial Imaging Review, Mask Blank Inspection, and EUV microscopy.
EUV-LPS and HPS systems
EUV light sources in the LPS and HPS product lines, with different brightness for low-power and intermediate-focus applications.
Services for EUV systems
Support services to optimize operation, adapt to technical requirements, and reduce operating costs.
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